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Featuring outstanding chromatic‑aberration correction and superior resolution, this objective delivers reliable imaging performance for semiconductor components, FPD, material analysis and precision‑mold manufacturing.

| Application | Objective | NA | W.D.(mm) | Cover-glass Thickness | Correction Ring | Spring-loaded | Bright-field | Dark-field | DIC | Phase Contrast | Polarization | Fluorescence | |||
| Visible | UV | NIR | |||||||||||||
| Bright-field/Dark-field | N-MPFN BD | 5× | 0.15 | 20 | - | ◎ | ◎ | ○ | △ | ○ | |||||
| 10× | 0.3 | 11 | - | ◎ | ◎ | ○ | △ | ○ | |||||||
| 20× | 0.45 | 3.1 | 0 | ◎ | ◎ | ○ | △ | ○ | |||||||
| N-LMPFN BD | LWD 20× | 0.4 | 12 | 0 | ◎ | ◎ | ○ | △ | ○ | ||||||
| LWD 50× | 0.5 | 10.6 | 0 | ◎ | ◎ | ○ | △ | ○ | |||||||
| LWD 100× | 0.8 | 3.5 | 0 | ◎ | ◎ | ○ | △ | ○ | |||||||
| N-MPLN BD | 5× | 0.15 | 20 | 0 | ◎ | ◎ | △ | ○ | |||||||
| 10× | 0.3 | 11 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| 20× | 0.45 | 3.1 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| 50× | 0.55 | 10.6 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| 100× | 0.8 | 3.5 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| Bright-field | N-MPLN | 5× | 0.15 | 20 | 0 | ◎ | ◎ | △ | ○ | ||||||
| 10× | 0.3 | 11 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| 20× | 0.45 | 3.1 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| 50× | 0.55 | 10.6 | 0 | ◎ | ◎ | △ | ○ | ||||||||
| 100× | 0.8 | 3.5 | 0 | ◎ | ◎ | △ | ○ | ||||||||


